The O836Si was designed to meet the low-level sensitivity and high precision demands of the silicon industry. By combining the unmatched sensitivity of our solid-state infrared detection system with our novel sample loading system and programmable impulse furnace, the O836Si provides accurate and precise oxygen results in materials such as silicon wafers. The low-level sensitivity and high precision has also been applied to the metals industry, determining the oxygen content in high purity copper for the electronics industry.