MTI Corporation - EQ-RTP-1000D4

Manufactured by  MTI Corporation
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Compact RTP Tube Furnace with 4" Quartz Tube & Digital Vacuum Gauge up to 1100C and Control Software

EQ-RTP-1000D4 is a compact rapid thermal processing tube furnace with 4" I.D. processing quartz tube and vacuum flange. It is designed for annealing semiconductor wafer or solar cell up to 3" diameter. RTP-1000D4 is heated by 10KW halogen light with max. 120°C/second heating rate. 50 segment precision temperature controller is built in with ±1°C. accuracy. RS485 port and control software are included to allow you running furnace and monitoring temperature profile via PC.
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Features of EQ-RTP-1000D4
Standard Package
  • Digital Vacuum Gauge Up to 10-4 Torr
  • 1/4NPS to KF-D25 quick adapter
  • Temperature PC Control System
  • Fuse of 63 Amps
  • Fuse of 4 Amps
  • Sample Holder for RTP furnace
  • Aluminum Nitride Substrate for RTP Furnace's Sample Holder 2
  • Refractory gloves , Fire-proof upto 900°C
  • Quartz Tube: 4.33" O.D x 4.05" I.D x 15" Length for RTP Tube Furnace - RTP-1000D4
  • Quartz heat shield disk
  • 20ft.(6m) polyurethane tube O.D. 12mm I.D. 8mm W.P. 100PSI
  • High Temperature Silicone Rubber O ring
  • Halogen light
  • water hose connector
  • A pair of Vacuum flange
  • Optional High Vacuum Package
General Specifications
Depth 13 in
Height21 in
Width 30 in
Maximum Temperature1100 °C
Power Requirements 208-240 VAC, 50/60 Hz, 9 kW max, >60 A breaker required
Weight100 lbs
Additional Specifications

Furnace structure: Double layer steel case with mullite liner without water cooling or air cooling
Heating element: 8 pcs Halogen light tube (D=10 L=300 T =200, mm)
Heating zone: 12" length with 4" constant temperature zone within ±1°C uniformity
Quart tube and sample holder:
- Quart Tube Size: 4.33" O.D x 4.05" I.D x 16.14" Length (110.10mm x 103.05mm x 410mm)
- 3" diameter Sample holder is inserted to sliding flange, which is made of quartz
- One 3" diameter AlN wafer is placed in the center of holder for annealing sample up to 3" dia.
- AlN has very high thermal conductivity, which provides the best temperature uniformity in the sample area
- The sample holder is removable from flange and use the RTP for other purpose
Vacuum flange: Made of stainless steel with double hi-temp. silicone O-rings, needle valves.
Water cooling jacket:
- You must implement cooling water during operation.
- Please make sure the flow rate of cooling water >= 3L/min at 25 PSI
- We suggest you using recirculating water chiller as cooling system (please order separately at the related product below) to save water.
- You can use flowing tap water as cooling source at flowing rate > 8 Liter/minute.
- Warning: This RTP furnace's Max holding time shall be less than 60 minutes at 1000 - 1200°C, otherwise O-ring may get melting
Flow meter: One flow meter is installed on the front panel to adjust gas flow from 0 - 160 ml/min
Vacuum gauge: Digital vacuum gauge with a measurement range from 1 mtorr~800 torr is installed with the furnace.
Vacuum pressure: Pressure can reach 50 mtorr by using mechanical vacuum pump with KF25 adapter. Pressure can reach 10-3 torr by molecular pump with KF25 adapter.
Temperature control: PID automatic control via SCR (Silicon Controlled Rectifier) power control, e.g. current limiting phase angle fired the resistor.
Thermal couple: S type
Programmable temperature controller: Built in protection from overheated and broken thermal couple
- 30 programmable segments
- Auto tune function
- Temperature control accuracy: ±0.5°C
- Built in RS485 port for PC control
- Software is included. (Computer is not included)
- One 15" screen laptop with operation software installed is available as option at $900 extra cost.
Max. heating rate: 50°C/sec recommended, and 120°C/sec. for short time ( furnace must preheated at 200°C for 10 20 minutes to get max heating rate )
Max. cooling rate: 64°C/min (Under vacuum: 200 mtorr), 117°C/min (Under atmosphere pressure)
Warranty: One year limited (not including halogen light damaged by user)

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