ULVAC - ARC PLASMA DEPOSITION
Low Cost PLD-Alternative
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Features of ARC PLASMA DEPOSITION
Applications for APD in Emerging Technologies
PEM Fuel Cell Catalysts (Pt on Carbon) with high specific activity and durability at low wt% loadings * Li-air Thin Film Batteries * Nanometal Particle Inks * Doping of Thermoelectric Materials * Doping of CIGS PV * Thin Film DLC / UNCD films * Magnetic material coatings
Benefits of the Arc Plasma Method * Can operate in UHV without the need for any gas inlet * Digital control of deposition allows for film thickness to be controlled to the nm level * Target material is highly ionized because it travels to the substrate through a strong plasma generated by the arc discharge of the source during each pulse of the deposition process * Strongly ionized stream of coating material results in particles or films that have excellent adhesion to the substrate being coated * Substrate temperature can be controlled anywhere from room temp to 350°C * Catalysts made using this dry vacuum technique have high specific activity at low wt% loading and pristine surfaces with no residual chemical contaminants
General Specifications
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