Hiden Analytical - SIMS Workstation

Manufactured by  Hiden Analytical
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A UHV Surface Analysis System, for thin film depth profiling.

SIMS (Secondary Ion Mass Spectrometer) is a high sensitivity surface analysis technique for the determination of surface composition, contaminant analysis and for depth profiling in a sample’s uppermost surface layers.

Applied to analysis within the first few microns of a surface, Hiden’s SIMS systems provide depth profiles with depth resolution to 5 nanometres.

The Hiden SIMS workstation provides for high performance static and dynamic SIMS applications for detailed surface composition analysis and depth profiling. The Hiden elemental SIMS imaging facility provides for high resolution surface chemical mapping. Hiden Bolt-On Components enable existing surface analysis equipment to be upgraded for high performance SIMS.

The Hiden SIMS Workstation, an integrated UHV / SIMS facility for advanced surface analysis, featuring:

  1. Hiden MAXIM SIMS analyser operating under MASsoft for ppb analysis.
  2. Intergrated ioniser for efficient SNMS analysis.
  3. Choice of differentially pumped Hiden IG20 Gas, IG-5C Caesium, IFG200 FAB or high performance liquid gallium guns as primary excitation source.
  4. Integral ion gun raster control with signal gating for depth profiling.
  5. Electron flood gun option for charge neutralisation in insulator studies.
  6. Vacuum chamber bakeout heaters.
  7. Fast sample transfer, sample holder and manipulator with load lock.
  8. UHV manipulator for optimum sample positioning.
  9. SIMS elemental imaging option with ESM LabVIEW SIMS Imaging program.
  10. Static SIMS Spectral Library available.
  11. Automatic SIMS ion optics lens tuning, and automatic mass alignment for optimum SIMS performance.
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Features of SIMS Workstation

A rugged general purpose SIMS and SNMS analysis station

  • Rapid turnaround of all types of samples
  • Static and dynamic SIMS
  • Integral ioniser for SNMS and RGA
  • Choice of Ion guns
  • SNMS surface mapping / imaging
  • Surface contamination analysis
  • Quantification of matrix level by SNMS
  • Flexible and upgradeable configuration
  • Low cost of ownership

Applications

  • Microelectronics
  • Polymers
  • Hard coatings
  • Gemstones
  • Nano films
  • Glass coatings
  • Paper
  • Materials Research
  • Metallurgical thin films
  • Semiconductors
General Specifications
Depth 1200 mm
Height1500 mm
Width 2000 mm
Mass Spectrometer TypeQuadrupole Mass Analyzer
Additional Specifications

A stainless steel UHV multi- port chamber with liquid nitrogen cryopanel, and fully integrated turbomolecular pumping system provides the UHV surface science platform required for high performance SIMS applications. A colour CCD camera provides optical sample images for overlay with SIMS elemental image maps.

A vacuum load lock/sample holder that accommodates single or multiple samples for rapid sample throughput is included.

Software: MASsoft PC SIMS software and ESM SIMS imaging.
Sample size: to 50mm dia and to 10mm depth.
Mass range: 1000 AMU for elemental, organics, and cluster analysis.
Sensitivity: >106 counts/second per nA.
System sensitivity is dependent on system configuration options
Analysers include: ion extraction optics, an energy analyser and triple filter quadrupole mass spectrometer,
power supply/interface unit, MASsoft PC SIMS software and connecting cables.
Energy analyser: Bessel box
Ion acceptance: In-line
Pole diameter: 6 mm
Mass range: 300 AMU or 510 AMU
Sensitivity: >5x10^3 cps/nA

SIMS Excitation sources
IG-20 Ion gun - Argon or Oxygen - Spot size: 100 um. Energy to 5KeV
T25 Liquid metal gallium ion gun - spot size: 1 micron - Energy to 20KeV
IFG-200 Primary fast atom source - Argon or Oxygen - Spot size: 2mm.
SIMS Excitation sources include power supplies/interfaces and differential pumping. Acquired data
integrated with beam raster for surface mapping.

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