ZEISS - LIBRA® 200 FE

Manufactured by  ZEISS
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FE-EFTEM with In-column Corrected OMEGA Filter

The LIBRA® 200 FE is the first EFTEM that combines the versatility of the new In-column corrected OMEGA energy filter with a highly efficient field emission system and Koehler illumination.  
  
The prealigned OMEGA filter provides fully integrated filtered imaging and spectroscopy capabilities for comprehensive analysis in semiconductor, material analysis and life science research. Consequently, the LIBRA® 200 FE ensures that you obtain optimum results from your sample with genuine ease of operation in EFTEM, EELS, HRTEM, STEM and diffraction work.  
  
The new 2nd order corrected spectrometer allows unrivalled isochromatic sample viewing areas and diffraction angle acceptance at sub-eV energy resolution. Excellent instrument performance results from the advanced 300 mm column concept and the newly developed control electronics for sub-ppm stability.  
  
The LIBRA® 200 FE is operated through dedicated control panels and the WinTEM™ GUI following the successful philosophy of the SEM instruments for maximum convenience and consistent look-and-feel operation across the complete EM product range.
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Features of LIBRA® 200 FE
  • 200 kV Schottky field emitter with Koehler illumination system  
  • Ultra high resolution over the full high voltage range  
  • In-column corrected OMEGA filter  
  • HR- and HT-objective lenses  
  • High precision 5-axes goniometer stage  
  • Rotation-free projector system  
  • 300 mm high stability column  
  • Dry differential vacuum system  
  • Sub-ppm stability control electronics  
  • WinTEM™ graphical user interface
General Specifications
Magnification8 to 1000000 x
Electron Microscope TypeTEM
Field Emission1
Microscope TypeElectron
Additional Specifications

Field Emitter: Schottky Field Emission System  
Accelerating voltage: 200 kV  
Patented Koehler Illumination (parallel illumination):  
Three-lens condenser system for parallel and homogeneous  
TEM wide-field illumination independent of illumination  
intensity  
Quick and easy switching between TEM and Spot mode by  
push-button operation  
Reproducible and controlled illumination conditions in TEM  
and Spot mode  
Condenser aperture automatically selected depending on  
magnification (AIS mode)  
  
Spatial resolution: Truly symmetrical objective lenses = two variants:  
Point resolution: 0.24 nm (HR) 0.29 nm (HT)  
Information Limit: 0.14 nm (HR) 0.19 nm (HT)  
STEM resolution: 0.30 nm (HR) 0.45 nm (HT)  
  
Energy resolution: = 0.7 eV  
  
Corrected OMEGA filter: Corrected for 2nd order and optimized for 3rd order aberrations  
Alignment: Factory alignment  
Dispersion: 1.85 µm/eV @ 200 kV  
Distortion: 100mrad @ ?E = 10 eV slit width and 200 kV  
> 150mrad @ ?E = 20 eV slit width and 200 kV  
Non-Isochromaticity: < 0.5 eV over Ø 2.5 µm field-of-view on sample  
  
Specimen stage: 5-axes fully eucentric goniometer  
Tilt range:   
a / ß ± 30° / ± 30° (HR pole piece)  
a / ß ± 70° / ± 30° (HT pole piece)  
both with double-tilt analytical holder  
a ± 70° (HR pole piece)  
with special tomography holder  
  
Imaging system: Two 3 lens projector groups in front and behind the energy filter  
  
Magnification  
STEM: 2,000 x - 5,000,000 x  
EELS: 20 x - 315 x (spectrum magnification)  
  
Vacuum system:  
Oil-free and differentially pumped vacuum system  
Pre-vacuum scroll pump with buffer tank  
TMP for viewing chamber, filter and airlock  
IGPs for the column  
2 IGPs for the emitter area  
System control: WinTEMTM Graphical User Interface (GUI) based on Windows® XP,  
operated by mouse, keyboard and dedicated control panels

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