ZEISS - LIBRA® 200 FE
FE-EFTEM with In-column Corrected OMEGA Filter
The prealigned OMEGA filter provides fully integrated filtered imaging and spectroscopy capabilities for comprehensive analysis in semiconductor, material analysis and life science research. Consequently, the LIBRA® 200 FE ensures that you obtain optimum results from your sample with genuine ease of operation in EFTEM, EELS, HRTEM, STEM and diffraction work.
The new 2nd order corrected spectrometer allows unrivalled isochromatic sample viewing areas and diffraction angle acceptance at sub-eV energy resolution. Excellent instrument performance results from the advanced 300 mm column concept and the newly developed control electronics for sub-ppm stability.
The LIBRA® 200 FE is operated through dedicated control panels and the WinTEM™ GUI following the successful philosophy of the SEM instruments for maximum convenience and consistent look-and-feel operation across the complete EM product range.
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Features of LIBRA® 200 FE
- 200 kV Schottky field emitter with Koehler illumination system
- Ultra high resolution over the full high voltage range
- In-column corrected OMEGA filter
- HR- and HT-objective lenses
- High precision 5-axes goniometer stage
- Rotation-free projector system
- 300 mm high stability column
- Dry differential vacuum system
- Sub-ppm stability control electronics
- WinTEM™ graphical user interface
General Specifications
Magnification | 8 to 1000000 x |
Electron Microscope Type | TEM |
Field Emission | 1 |
Microscope Type | Electron |
Additional Specifications
Field Emitter: Schottky Field Emission System
Accelerating voltage: 200 kV
Patented Koehler Illumination (parallel illumination):
Three-lens condenser system for parallel and homogeneous
TEM wide-field illumination independent of illumination
intensity
Quick and easy switching between TEM and Spot mode by
push-button operation
Reproducible and controlled illumination conditions in TEM
and Spot mode
Condenser aperture automatically selected depending on
magnification (AIS mode)
Spatial resolution: Truly symmetrical objective lenses = two variants:
Point resolution: 0.24 nm (HR) 0.29 nm (HT)
Information Limit: 0.14 nm (HR) 0.19 nm (HT)
STEM resolution: 0.30 nm (HR) 0.45 nm (HT)
Energy resolution: = 0.7 eV
Corrected OMEGA filter: Corrected for 2nd order and optimized for 3rd order aberrations
Alignment: Factory alignment
Dispersion: 1.85 µm/eV @ 200 kV
Distortion: 100mrad @ ?E = 10 eV slit width and 200 kV
> 150mrad @ ?E = 20 eV slit width and 200 kV
Non-Isochromaticity: < 0.5 eV over Ø 2.5 µm field-of-view on sample
Specimen stage: 5-axes fully eucentric goniometer
Tilt range:
a / ß ± 30° / ± 30° (HR pole piece)
a / ß ± 70° / ± 30° (HT pole piece)
both with double-tilt analytical holder
a ± 70° (HR pole piece)
with special tomography holder
Imaging system: Two 3 lens projector groups in front and behind the energy filter
Magnification
STEM: 2,000 x - 5,000,000 x
EELS: 20 x - 315 x (spectrum magnification)
Vacuum system:
Oil-free and differentially pumped vacuum system
Pre-vacuum scroll pump with buffer tank
TMP for viewing chamber, filter and airlock
IGPs for the column
2 IGPs for the emitter area
System control: WinTEMTM Graphical User Interface (GUI) based on Windows® XP,
operated by mouse, keyboard and dedicated control panels