Tescan - The LYRA 3 FEG

Manufactured by  Tescan
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Formula 1 for Nanotechnology

The LYRA 3 FEG is a favorable combination of SEM and FIB for demanding users. It is based on a high resolution Schottky FEG-SEM column and a high performance FIB column.   
  
FEG SEM Part  
The SEM column on the is based on the MIRA 3 Wide Field OpticsTM design with a Schottky field emission gun.  
      
  1. Imaging function  
  2. Micro-analytical function  
  3. Navigation function  
  4. E-Beam lithography available with an optional Beam Blanker  
  
FIB Part  
A unique ion optic column differentially pumped (2 ion pumps) for ultra-low ion scattering effect equipped with gallium ion liquid metal source.  
Motorized aperture changer with ultra-high reproducibility. Beam Blanker and Faraday cup included as standard.  
      
  1. Micro/nano machining  
  2. Ion beam lithography  
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Features of The LYRA 3 FEG
      
  • System has a fully integrated software control SEM / FIB / GIS for all jobs  
  • New generation of DrawBeam lithography module for pattern programming.  
  • System is built upon the extra large specimen chamber with optimized microanalytical ports.  
General Specifications
Microscope TypeElectron

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