Tescan - The LYRA 3 FEG
Manufactured by Tescan
Formula 1 for Nanotechnology
The LYRA 3 FEG is a favorable combination of SEM and FIB for demanding users. It is based on a high resolution Schottky FEG-SEM column and a high performance FIB column.
FEG SEM Part
The SEM column on the is based on the MIRA 3 Wide Field OpticsTM design with a Schottky field emission gun.
FIB Part
A unique ion optic column differentially pumped (2 ion pumps) for ultra-low ion scattering effect equipped with gallium ion liquid metal source.
Motorized aperture changer with ultra-high reproducibility. Beam Blanker and Faraday cup included as standard.
FEG SEM Part
The SEM column on the is based on the MIRA 3 Wide Field OpticsTM design with a Schottky field emission gun.
- Imaging function
- Micro-analytical function
- Navigation function
- E-Beam lithography available with an optional Beam Blanker
FIB Part
A unique ion optic column differentially pumped (2 ion pumps) for ultra-low ion scattering effect equipped with gallium ion liquid metal source.
Motorized aperture changer with ultra-high reproducibility. Beam Blanker and Faraday cup included as standard.
- Micro/nano machining
- Ion beam lithography
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Documents & Manuals
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Features of The LYRA 3 FEG
- System has a fully integrated software control SEM / FIB / GIS for all jobs
- New generation of DrawBeam lithography module for pattern programming.
- System is built upon the extra large specimen chamber with optimized microanalytical ports.
General Specifications
| Microscope Type | Electron |
